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New Chemical Design Philosophy
Reaction schema
I) Schema for a crosslinker consisting of A) a linker B) photoactive moeities and C) an optional sidegroup. II) Dewetting induced by exposure of PS films to toluene vapor: (a) irradiated 7 nm PS film containing a ratio of bis-BP to PS of 18:1;(b) 7 nm PS film without bis-BP; © irradiated 25 nm PS film containing a ratio of bis-BP to PS of 4:1; (d) 25 nm PS film without bis-BP. Figure adapted from Carroll, GT, JT Koberstein et al, Langmuir, 2006, 22 (18), 7748-7754. III) Hydrogels of hydroxyethylmethacrylate created using bis-BP A) swollen in deionized water and B) dry.
Credits: Jeffrey Koberstein
