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Novel broadband THz antireflection coating with graded index spiral structures
Novel broadband THz antireflection coating with graded index spiral structures
Fig. 1 Cross sectional view of scanning electron microscopy image of a Si THz antireflection coating with a graded index spiral structure. The film was grown using an e-beam oblique angle deposition technique by dynamically varying the incident flux angle with respect to the substrate normal. The different layers of spiral structure were obtained by rotating the substrate at different speed during deposition. The density of the film changes progressively less dense from the Si substrate to the ambient air.
Credits: Michael Riley, T.-M. Lu and Joel Plawsky
