Achievement
Improvement of Magnetic Tunnel Junctions (MTJ)
Research Achievements
Improvement of Magnetic Tunnel Junctions (MTJ)
The improvement of Magnetic Tunnel Junctions (MTJ) will lead to greater MRAM capacity and sensing applications. Seeking to identify a better MTJ composition, we fabricated GaN-based metal ferroelectric semiconductor structure using Barium Titanate (BTO) as dielectric layer grown by pulsed laser deposition. The voltage (C-V) measurements show the hysteresis at high frequency 2MHz and it tracks the trend of high-K dielectric behavior on n-type GaN semiconductor. The C-V characteristics of BTO/GaN structures depict the metal oxide semiconductor behavior with clear transition from accumulation, depletion at a flat band voltage of 3.28 V. In addition, BTO layer has been grown on magnetic LaSrMnO film and polarization studies show that the BTO layer can be locally polarized - very first study in this field. The demonstration of local polarization of the ultra-thin piezoelectric film surface enhances our understanding of the functionality of MTJs where this is used as an insulating layer.
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